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Vacuum equipment

Plasma Treatment System

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Plasma Treatment System 


Power: RF Generator (300W, 13.56MHz)

Process Gas: 2sets of MFC

Vacuum Gauge: 1000 ~ 10-4Torr

Input Power: 220V 단상


Application: 

  • Plasma activation.
  • Plasma etching.
  • Low temperature Plasma ashing.
  • SEM and TEM sample preparation.
  • Fine cleaning of High precision mechanical parts.
  • Textile surface treatments.
  • Microfluidics component treatment.
  • Oftalmic(Contact lens wettability).
  • Plastic treatment before printing or painting process.
  • sterilization of medical equipment and consumables.
  • Dental implant cleaning treatment.
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