Plasma Treatment System
Power: RF Generator (300W, 13.56MHz)
Process Gas: 2sets of MFC
Vacuum Gauge: 1000 ~ 10-4Torr
Input Power: 220V 단상
Application:
- Plasma activation.
- Plasma etching.
- Low temperature Plasma ashing.
- SEM and TEM sample preparation.
- Fine cleaning of High precision mechanical parts.
- Textile surface treatments.
- Microfluidics component treatment.
- Oftalmic(Contact lens wettability).
- Plastic treatment before printing or painting process.
- sterilization of medical equipment and consumables.
- Dental implant cleaning treatment.
Tel : +82-31-411-5895 / Fax : +82-31-411-5890 / E-mail : m5898@naver.com
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