Vacuum Evaporation System
Deposition Source: Thermal Evaporation (Tungsten Boat)
3 Chanel selection availible
Thickness monitor: 1 Chanel
Pumping System: Turbo pump and Rotary pump
Substrate: Rotation.
Control: PLC
Ultimate pressure: 3 x 10-6 torr
Magnetron Sputter
Magnetron Sputtering System Specification Deposition source: 3 sets of Magnetron Cathode with shutter Power source: 2 sets of DC(1kW) 1 set of RF (600W) Sample loading: Load lock chamber Substrate: 4inch (Rot...
Evaporation System (3 chanel)
Vacuum Evaporation System Deposition Source: Thermal Evaporation (Tungsten Boat) 3 Chanel selection availible Thickness monitor: 1 Chanel Pumping System: Turbo pump and Rotary pump Substrate: Rotation. Control: PLC Ultim...
High Density RF Plasma Treatment System
High Density RF Plasma System 고밀도 알에프 플라즈마 표면처리장치 입니다. Sample의 열충격 방지를 위한 Substrate water cooling 이 가능하며 Gas shower head 채택하여 Plasma 처리시 균일도를 높였습니다. 2개의 MFC와 Bypass vacuum line ...
Plasma Treatment System
Plasma Treatment System Power: RF Generator (300W, 13.56MHz) Process Gas: 2sets of MFC Vacuum Gauge: 1000 ~ 10-4Torr Input Power: 220V 단상 Application: Plasma activation. Plasma etching. Low temperature Plasma ashing. SEM ...
