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Vacuum equipment

R&D用 RF Plasma Treatment System

조회 수 14099 추천 수 0 2013.03.20 15:06:01

RF Plasma Treatment System

 

뛰어난 성능, 탁월한 가격 경쟁력을 갇춘 RF Plasma treatment system을 소개합니다. 

 

Lab에서의 연구에 적합하도록 Compact한 size로 구현된 본 제품은 원형의 Quartz chamber가 아닌

Stainless steel을 사용하여 충격에 강하며 RF electrode에 Dark shield가 장착되어 안정적이면서도 강한 RF Plasma 효과를

얻을수 있습니다.

본 제품은 10개의 process를 저장하여 Recipe에 따라 Full automation 공정 가능합니다.

 

 

 

 

Specification:

  • System dimension: 460 x 370 x 180mmHLab plasma system01.png
  • Chamber: 120 x 200 x 87mmH (STS 304)
  • RF Power: 200W, 13.56MHz
  • Vacuum Gauge: Pirani sensor
  • Process gas regulation: 2 sets of MFC
  • Gas compatibility: Air, O2, N2, Ar, froming gas, NO2, N2O etc.
  • Display: Touchscreen
  • Input power: 220V, 60Hz

 

Application:

  • Plasma activation.
  • Plasma etching.
  • Low temperature Plasma ashing.
  • SEM and TEM sample preparation.
  • Fine cleaning of High precision mechanical parts.
  • Textile surface treatments.
  • Microfluidics component treatment.
  • Oftalmic(Contact lens wettability).
  • Plastic treatment before printing or painting process.
  • sterilization of medical equipment and consumables.
  • Dental implant cleaning treatment.

lab plasma system.png

 

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